Business unit
Photovoltaic
SEABatch XL
Optimized system for high-efficiency solar cell (n-type)
Ultra capacity batch equipment (highest cost performance)
Features & Benefits
Various batch application
- Alkaline / Acidic texturing / Oxidation
- pSC1 / SC2 / O3 cleaning
- TOPCon, PERC, HIT
13800
High throughput
- 600 wafers load
- up to 12,000 w/h
210
Capable Si wafer size
Up to M12 (210 x 210mm)
High dosing accuracy
+/- 2%
Non metal component
Perfect Drying
SEAline XL
Optimized system for n-type inline application
Features & Benefits
Various inline application
- HF/Metal Cleaning
- RCA & O3 Cleaning
- Developing / Etching / Striping
- Electrical deposition
Various cleaning solutions
- Roller brush / Disc brush
- Bubble jet
- Ultrasonic / Plasma
210
Capable Si wafer size
up to M12 (210 x 210mm)
Particle free design
Perfect Drying
Glass (Thin film, FPD)
SEAline Glass Cleaner
Aim to zero particle
Features & Benefits
Various inline application
- RCA & O3 Cleaning
- Developing / Etching / Striping
Various cleaning solutions
- Roller brush / Disc brush
- Bubble jet
- Ultrasonic / Plasma
Capable glass size
Generation 7
Perfect Drying
Particle free design
Semiconductor
SEAbatch SEMI
Ultra capacity batch equipment (highest cost performance)
Features & Benefits
Various batch application
- RCA / SPM / HFO3 / DIO3 cleaning
- Developing / Etching / Stripping
- Oxidation / Special drying
Available for substrate
- Si wafer up to 300mm
- Glass / Ceramics up to 500x500mm
Particle performance
- RCA cleaning < 30EA
- Dry < 30EA
High dosing accuracy
+/- 2ml
Perfect Drying
Non metal component